Projects that improve sustainability do not have to be complex and cumbersome.
One of the areas that can have an IMMEDIATE impact on semiconductor sustainability is more efficient process chamber cleans. Chamber cleans use some of the most polluting greenhouse gases (GHG), NF3, SF6 and CF4, which are upto 22,000x more potent than CO2.
Several of Atonarp's clients are using Aston for end point detection based chamber clean, versus timed based clean solutions with dramatic effects in improved efficiency. Upto 70% shorter clean times, significantly less NF3 usage, less overall abatement and less NF3 venting (as NF3 abatement is not 100% efficient). This is a win-win-win for throughput-sustainability-cost:
Aston can easily be added to an existing chamber foreline for efficient sociometric clean end point detection, enable a more sustainable process and save move through greater system throughput.